Substrate processing apparatus
AssigneeSCREEN Holdings Co., Ltd.
InventorShuhei Nemoto
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AssigneeSCREEN Holdings Co., Ltd.
InventorShuhei Nemoto
Estimating the term…
In an substrate processing apparatus according to the present invention, a chamber is configured so as to cover an internal space with a bottom wall, side walls extending from the periphery of the bottom wall, and a ceiling wall covering the upper end of the side walls. A plurality of base support members stand vertically upward from the bottom wall, and the base member is supported by upper end portions of these base support members. A so-called raised floor structure is formed. Then, the substrate processing part is installed on the upper surface of the base member. By adopting such a layout using the raised floor structure, even if leakage of the processing liquid occurs and the processing liquid is pooled on the bottom wall of the chamber, it is possible to reliably prevent the processing liquid from coming into contact with the substrate processing part.
A substrate processing apparatus, comprising:
A substrate processing apparatus, comprising:
Dependencies are inferred from the claim text.