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US 12,727,412 B2Granted
Etching compositions
AssigneeFujifilm Electronic Materials U.S.A., Inc.
InventorMick Bjelopavlic
Life of this patent
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Abstract
The present disclosure is directed to etching compositions that are useful for, e.g., selectively removing silicon from a semiconductor substrate as an intermediate step in a multistep semiconductor manufacturing process.
Claims16
An etching composition, comprising:
- at least one quaternary ammonium hydroxide or a salt thereof, wherein the at least one quaternary ammonium hydroxide or a salt thereof is in an amount of from about 0.1 wt % to about 10 wt % of the composition;
- at least one alkanolamine, wherein the at least one alkanolamine is in an amount of from about 0.01 wt % to about 10 wt % of the composition;
- at least one SiGe corrosion inhibitor comprising 11-mercaptoundecylphosphoric acid, 8-mercaptooctanoic acid, 6-mercaptohexanoic acid, 12-mercaptododecanoic acid, 8-quinolinylboronic acid, 8-aminoquinoline, 8-quinolinecarboxylic acid, 8-quinolinethiol, 2,8-quinolinediol, 8-quinolinylacetic acid, 8-quinolinesulfonic acid, 2-methyl-8-quinolinol, 5-hydroxyquinoline, or 6-hydroxyquinoline;
- at least one polymerized naphthalene sulfonic acid;
- at least one organic solvent;
- and
- water,
- wherein the composition is substantially free of fluorine-containing compounds.
5 more elements
An etching composition, comprising:
- at least one quaternary ammonium hydroxide or a salt thereof;
- at least one alkanolamine;
- at least one SiGe corrosion inhibitor comprising a mercapto-containing acid, a substituted quinoline, or a salt thereof;
- wherein the mercapto-containing acid comprises a mercapto-containing phosphoric acid or a mercapto-containing carboxylic acid, wherein the mercapto-containing acid comprises 11-mercaptoundecylphosphoric acid, 8-mercaptooctanoic acid, 6-mercaptohexanoic acid, or 12-mercaptododecanoic acid;
- wherein the substituted quinoline comprises a quinoline substituted by NH2, COOH, SH, CH2COOH, SO3H, or a boronic acid group;
- at least one polymerized naphthalene sulfonic acid;
- at least one organic solvent;
- and
- water,
- wherein the composition is substantially free of fluorine-containing compounds.
7 more elements
Dependencies are inferred from the claim text.