Method of manufacturing display device and display device manufactured thereby

A method of manufacturing a display device, the method comprising:

• forming an organic layer on an encapsulation layer disposed on a light emitting layer;
• forming a slit layer on the organic layer, wherein a slit exposing at least a portion of a top surface of the organic layer is formed in the slit layer;
• forming a first trench by performing a primary etching on the organic layer by using the slit layer as a mask;
• forming a first inorganic protective layer covering a side surface of the first trench;
• forming a second trench extending from the first trench by performing a secondary etching on the organic layer by using the slit layer as a mask;
• forming an (N−1)th inorganic protective layer covering side surfaces of first to (N−1)th trenches, forming an Nth trench extending from the (N−1)th trench by performing an Nth-degree-etching on the organic layer by using the slit layer as a mask, wherein forming an additional inorganic protective layer and forming an additional trench are repeatedly performed (N−2) times, respectively, and N is a natural number that is greater than or equal to 3;
• and
• forming a light blocking material filling the first to Nth trenches.