Ceramic sintered body for semiconductor production equipment and manufacturing method thereof
AssigneeCoorsTek, Inc.
InventorManami Sugiyama
Life of this patent
Estimating the term…
Abstract
A ceramic sintered body for semiconductor production equipment and a manufacturing method thereof capable of giving a high-density oxyfluoride ceramic sintered body without any peculiar circumstances. The ceramic sintered body for semiconductor production equipment of the present invention has a main phase of an oxyfluoride with a polycrystalline structure having 50% or more of crystals with a grain size of 1 to 5 μm or has a multiple phase of the oxyfluoride and a fluoride; and has an L* value of 20 to 65, an a* value of −1 to 10 and a b* value of −1 to 10 in the L*a*b* color system.
Claims6
A ceramic sintered body for semiconductor manufacturing equipment, comprising:
- an oxyfluoride with a polycrystalline structure having 50% or more of crystals with a grain size of 1 to 5 μm;
- or
- a mixture of the oxyfluoride and a fluoride, each having a polycrystalline structure in which 50% or more of the crystals have a grain size of 1 to 5 μm
- wherein an average crystal grain size is 3 μm or more and 5 μm or less, and
- wherein an L* value of 37.7 to 44.5, an a* value of 0.2 to 0.3 and a b* value of 1.6 to 2.0 in the L*a*b* color system.
Dependencies are inferred from the claim text.