Absorption spectrum-based chemical vapor deposition online in-situ characterization system and method

A system, comprising

• a spectrum movement and optical path calibration device, and
• a tubular chemical vapor deposition (CVD) device;
• a light source;
• and
• a spectrometer;
• wherein the spectrum movement and optical path calibration device comprises two linear guide rails;
• wherein the light source and the spectrometer are respectively mounted on the two linear guide rails;
• wherein the tubular CVD device comprises a furnace chamber, a quartz tube, and a quartz boat disposed within the quartz tube for holding a deposited sample;
• wherein the furnace chamber comprises two optical access slots parallel to the quartz tube, the two optical access slots are symmetrically arranged with respect to an axial centerline of the quartz tube;
• wherein the two linear guide rails are respectively located at positions outside the furnace chamber corresponding to the two optical access slots;
• wherein light source and the spectrometer are configured to move linearly in an axial direction of the quartz tube and to detect samples at various positions in the quartz tube;
• wherein the spectrometer is configured to analyze light emitted from the light source, through the optical access slots, the quartz tube and the deposited sample, and then incident on the spectrometer;
• wherein the light source has a continuous emission spectrum covering a wavelength range of 200-1050 nm;
• wherein the spectrometer is configured to analyze the light based on a difference between a red-light compensation spectrum acquired without any sample in the tubular CVD device and a real-time absorption spectrum acquired during a deposition process.