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US 12,723,311 B2Granted
Dual ampoule separator plate and method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChi-Wen Chiu, Chih-Chang Wu, Che-Wei Tung, Chiang Hsien Shih, Chin-Szu Lee
Life of this patent
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Abstract
A system and method for reducing thermal transfer in a dual ampoule system. The dual ampoule system includes a first ampoule, a second ampoule, and a planar heat shield. The planar heat shield is positioned between the first ampoule and the second ampoule, where the planar heat shield is configured to resist thermal transfer between the first ampoule and the second ampoule.
Claims20
A dual ampoule system, comprising:
- a first ampoule;
- a second ampoule;
- a first hot can above the first ampoule;
- a second hot can above the second ampoule;
- a planar heat shield, positioned between the first ampoule and the second ampoule, comprising a first region and a second region,
- wherein the planar heat shield is configured to resist thermal transfer between the first ampoule and the second ampoule,
- wherein the first region is between the first ampoule and the second ampoule, and
- wherein the second region is between the first hot can and the second hot can and has a width that is less than a width of the first region;
- one or more gas lines extending between the first hot can and the second hot can, wherein the second region is positioned around the one or more gas lines;
- an adjustable bracket, coupled to an end of the planar heat shield, configured to allow the planar heat shield to be selectively positioned closer to the first ampoule or the second ampoule,
- wherein the end of the planar heat shield extends outward from between the first ampoule and the second ampoule to provide access to the adjustable bracket;
- a fan, adjacent to at least one of the first ampoule or the second ampoule, configured to generate an airflow around one or more of the first ampoule or the second ampoule;
- and
- an exhaust line, located below and between the first ampoule and the second ampoule, configured to receive the airflow.
11 more elements
A deposition system, comprising:
- a processing chamber;
- and
- a dual ampoule system, including:
- a first ampoule and a second ampoule, wherein the first ampoule and the second ampoule are configured to:
- respectively generate a first precursor gas at a first temperature, and a second precursor gas at a second temperature, and
- respectively provide the first precursor gas and the second precursor gas to the processing chamber for use in a same barrier layer deposition operation,
- wherein the first temperature is greater than the second temperature,
- a first hot can, above the first ampoule, and a second hot can, above the second ampoule,
- a fan, adjacent to at least one of the first ampoule or the second ampoule, configured to generate an airflow around one or more of the first ampoule or the second ampoule,
- an exhaust line, located below and between the first ampoule and the second ampoule, configured to receive the airflow, and
- a planar heat shield, between the first ampoule and the second ampoule, configured to:
- at least partially thermally isolate the second ampoule and the first ampoule, and
- resist absorption of convection heat from the first ampoule,
- wherein the planar heat shield comprises a first region, between the first ampoule and the second ampoule, and a second region, between the first hot can and the second hot can, wherein the second region has a width that is less than a width of the first region, and
- one or more gas lines extending between the first hot can and the second hot can, wherein the second region is positioned around the one or more gas lines.
12 more elements
A deposition system, comprising:
- a processing chamber;
- a dual ampoule system, including:
- a first ampoule configured to provide a first precursor gas, at a first temperature, to the processing chamber,
- a second ampoule configured provide a second precursor gas, at a second temperature greater than the first temperature, to the processing chamber,
- a first hot can, above the first ampoule, and a second hot can, above the second ampoule,
- a planar heat shield, positioned between the first ampoule and the second ampoule, comprising a first region and a second region,
- wherein the first region is between the first ampoule and the second ampoule, and
- wherein the second region is between the first hot can and the second hot can and has a width that is less than a width of the first region;
- one or more gas lines extending between the first hot can and the second hot can, wherein the second region is positioned around the one or more gas lines,
- a fan, adjacent to at least one of the first ampoule or the second ampoule, configured to generate an airflow around one or more of the first ampoule or the second ampoule, and
- an exhaust line, located below and between the first ampoule and the second ampoule, configured to receive the airflow;
- and
- a controller configured to:
- cause the first ampoule to be maintained at the first temperature, and
- cause the second ampoule to be maintained at the second temperature.
12 more elements
Dependencies are inferred from the claim text.