Active metal brazing substrate and method for manufacturing the same
AssigneeTong Hsing Electronic Industries, Ltd.
InventorsChih-Wei Mao, Tsung-Ying Chang, Chung-Ho Wei, Ming-Yi Hsu, Chi-Wen Huang
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AssigneeTong Hsing Electronic Industries, Ltd.
InventorsChih-Wei Mao, Tsung-Ying Chang, Chung-Ho Wei, Ming-Yi Hsu, Chi-Wen Huang
Estimating the term…
An active metal brazing substrate and a method for manufacturing the same are provided. The active metal brazing substrate includes a ceramic substrate layer, an active metal layer, and a conductive metal layer. The active metal layer is disposed between the ceramic substrate layer and the conductive metal layer. The active metal layer is formed from an active metal solder and an organic dispersion medium. The active metal solder includes silver, copper, and an active metal. Based on a total weight of the active metal solder being 100 wt %, an amount of the silver ranges from 10 wt % to 60 wt %. A peel strength between the ceramic substrate layer and the conductive metal layer ranges from 165 N/cm to 270 N/cm.
An active metal brazing substrate, comprising:
A method for manufacturing an active metal brazing substrate, comprising:
An active metal brazing substrate, comprising:
Dependencies are inferred from the claim text.