Coating device
AssigneeChugai Ro Co., Ltd.
InventorTsutomu Nishio
Life of this patent
Estimating the term…
Loading patent…
AssigneeChugai Ro Co., Ltd.
InventorTsutomu Nishio
Estimating the term…
In a coating device wherein a relative movement between an application nozzle located above a coated object W and the coated object is effected to apply a coating liquid P in a coating liquid reservoir of the application nozzle onto a surface of the coated object via a slit-shaped discharge port, the coating device includes: a shutter member rotatable in the coating liquid reservoir to open or close space between the coating liquid reservoir and the slit-shaped discharge port; and a gas feed regulation means for regulating the pressure on the coating liquid in the coating liquid reservoir, and is characterized in that in a state where the gas feed regulation means maintains the pressure on the coating liquid in the coating liquid reservoir to be at a given level, the shutter member is rotated to open or close space between the coating liquid reservoir and the slit-shaped discharge port.
A coating device comprising a coating liquid feed device, a coating liquid reservoir in an application nozzle, and a slit-shaped discharge port,
Dependencies are inferred from the claim text.