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US 12,722,140 B2Granted
Systems and methods for purifying solvents
AssigneeFujifilm Electronic Materials U.S.A., Inc.
InventorsStephen Earl Dyer, Brendan Thomas Lane, Patrick Adams Mahoney, Sr.
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Abstract
The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.
Claims18
A system, comprising:
- a first filter unit, wherein the first filter unit comprises a first housing and at least one first filter in the first housing, and the first filter comprises a filtration medium having a first average pore size;
- and
- a second filter unit downstream of and in fluid communication with the first filter unit, wherein the second filter unit comprises a second housing and at least two second filters in the second housing, the at least two second filters are arranged in the second housing in parallel, and each of the second filters independently comprises a filtration medium having a second average pore size;
- a fourth filter unit disposed downstream of the second filter unit, wherein the fourth filter unit comprises a fourth housing and at least two fourth filters in the fourth housing, the at least two fourth filters are arranged in the fourth housing in parallel, and each of the fourth filters independently comprises a filtration medium having a fourth average pore size;
- wherein the number of the first filter in the first filter unit is smaller than the number of the second filters in the second filter unit, and the first average pore size is larger than the second average pore size;
- and
- wherein the number of the second filters in the second filter unit is smaller than the number of the fourth filter in the fourth filter unit.
4 more elements
Dependencies are inferred from the claim text.