Image display device and method for manufacturing image display device

A method for manufacturing an image display device, the method comprising:

• providing a semiconductor growth substrate comprising a semiconductor layer on a first substrate, the semiconductor layer comprising a light-emitting layer;
• forming a metal layer on the semiconductor layer;
• after forming the metal layer on the semiconductor layer, bonding the semiconductor layer to a second substrate via the metal layer, wherein the second substrate comprises a circuit, and the circuit comprises a circuit element;
• forming a light-emitting element by patterning the semiconductor layer;
• forming a first wiring layer by patterning the metal layer, the first wiring layer directly contacting the light-emitting element;
• forming an insulating film that covers the light-emitting element and the first wiring layer;
• forming a first via that extends through the insulating film to the circuit;
• forming a second via that extends through the insulating film to the first wiring layer so as to directly contact the first wiring layer;
• and
• forming a second wiring layer on the insulating film, the second wiring layer comprising a first wiring portion and a second wiring portion;
• exposing a surface of the light-emitting element by removing a portion of the insulating film;
• and
• forming a transparent electrode that electrically connects the first wiring portion and the exposed surface of light-emitting element;
• wherein;
• the second via electrically connects the first wiring layer to the second wiring portion;
• and
• the first wiring portion, the transparent electrode, the light-emitting element, the first wiring layer, the second via, the second wiring portion, the first via, and the circuit element are connected in series.