Substrate processing apparatus and substrate processing method
AssigneeTokyo Electron Limited
InventorsHayato Tanoue, Kento Araki, Yohei Yamashita, Gousuke Shiraishi
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AssigneeTokyo Electron Limited
InventorsHayato Tanoue, Kento Araki, Yohei Yamashita, Gousuke Shiraishi
Estimating the term…
A substrate processing apparatus configured to process a combined substrate in which a first substrate and a second substrate are stacked on top of each other includes a substrate holder configured to hold the combined substrate; a laser radiating unit configured to radiate laser light to a laser absorbing film in a pulse shape; a moving mechanism configured to move the substrate holder and the laser radiating unit relative to each other; and a controller configured to control the laser radiating unit and the moving mechanism. The controller performs, based on a thickness of the laser absorbing film, a control of selecting a position of a separation surface between the first substrate and the second substrate from one of a position between the first substrate and the laser absorbing film or a position between the a separation facilitating film and the second substrate.
A substrate processing method of processing a combined substrate in which a first substrate, an interface layer including a laser absorbing film and a separation facilitating film at least, and a second substrate are stacked on top of each other, the substrate processing method comprising:
Dependencies are inferred from the claim text.