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US 12,721,086 B2Granted
Holding table
AssigneeDisco Corporation
InventorRyogo Maji
Life of this patent
Estimating the term…
Abstract
A holding table includes a holder made of porous ceramic and configured to hold a workpiece thereon. The holder contains an oxide semiconductor. The holder has a volume resistivity in the range of 1×10−8 to 1×10−6 Ω·m. The oxide semiconductor is in the range of 3% by volume to 20% by volume in terms of a blending ratio. The oxide semiconductor includes tin oxide, titanium oxide, nickel oxide, or zinc oxide.
Claims6
An apparatus for processing a workpiece comprising:
- a base having a circular cavity defined therein, wherein the base includes an annular ridge around the circular cavity;
- and
- a holder fitted in the circular cavity in the base, such that the annular ridge of the base surrounds the holder, wherein the holder contains porous ceramic and an oxide semiconductor, such that the holder contains therein a plurality of pores,
- wherein the holder is configured and arranged to be connected to a suction source such that a negative pressure transmitted from the suction source acts through the pores in the holder to attract and hold the workpiece under suction on a holding surface of the holder, wherein
- the oxide semiconductor has a blending ratio in a range of 3% by volume to 20% by volume.
2 more elements
Dependencies are inferred from the claim text.