Gas injector assembly
AssigneeASM IP Holding B.V.
InventorsTheodorus G.M. Oosterlaken, Kelly Houben, Herbert Terhorst, Cornelis Herbschleb
Life of this patent
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Abstract
A gas injector assembly and a substrate processing apparatus comprising the gas injector assembly is disclosed. Embodiments of the presently described gas injector assembly comprise a gas injector, a first precursor gas supply conduit and a second precursor gas supply conduit. A size of the first precursor gas supply conduit is larger than the size of the second precursor gas supply conduit.
Claims17
A gas injector assembly for providing a process gas to a process chamber of a semiconductor processing apparatus, the gas injector assembly comprising:
- a gas injector comprising:
- an injector tube for injecting the process gas to the process chamber of the semiconductor processing apparatus, the injector tube extending along a first axis in a longitudinal direction from a first end to a second end, and
- a feed end, proximate to the first end, comprising a first precursor gas inlet and a second precursor gas inlet for providing a first precursor gas and a second precursor gas, respectively, to the injector tube to form the process gas,
- a first precursor gas supply conduit connecting the first precursor gas inlet to a first precursor gas entry;
- and
- a second precursor gas supply conduit connecting the second precursor gas inlet to a second precursor gas entry,
- wherein a size of the first precursor gas supply conduit extending from the first precursor gas entry to the first precursor gas inlet is larger than the size of the second precursor gas supply conduit extending from the second precursor gas entry to the second precursor gas inlet.
A semiconductor processing apparatus for processing a plurality of substrates, comprising:
- a process chamber extending longitudinally in a vertical direction,
- a substrate boat, receivable in the process chamber, for holding the plurality of substrates, and
- a gas injector assembly inside the process chamber, for providing a process gas into the process chamber, the gas injector assembly comprising:
- a gas injector, the gas injector comprising:
- an injector tube for injecting the process gas to the process chamber, the injector tube extending along a first axis in a longitudinal direction from a first end to a second end, and
- a feed end, proximate to the first end, comprising a first precursor gas inlet and a second precursor gas inlet for providing a first precursor gas and a second precursor gas, respectively, to the injector tube to form the process gas,
- a first precursor gas supply conduit connecting the first precursor gas inlet to a first precursor gas entry;
- and
- a second precursor gas supply conduit connecting the second precursor gas inlet to a second precursor gas entry,
- wherein a size of the first precursor gas supply conduit extending from the first precursor gas entry to the first precursor gas inlet is larger than the size of the second precursor gas supply conduit extending from the second precursor gas entry to the second precursor gas inlet.
Dependencies are inferred from the claim text.