Method of fabricating display device using sacrificial film

A method of fabricating a display device, comprising the steps of:

• forming a first pixel electrode and a second pixel electrode;
• forming a first insulating layer comprising a region covering an end portion of the first pixel electrode and a region covering an end portion of the second pixel electrode;
• forming a first EL film over the first pixel electrode, the first insulating layer, and the second pixel electrode;
• forming a first sacrificial film covering the first EL film;
• etching the first sacrificial film to form a first sacrificial layer comprising a region overlapping with the first pixel electrode;
• etching the first EL film and a part of the first insulating layer using the first sacrificial layer as a mask to form a first EL layer and a second insulating layer each comprising a region overlapping with the first sacrificial layer and to expose the second pixel electrode and a part of a top surface of the second insulating layer;
• forming a second EL film over the first sacrificial layer, the second insulating layer, and the second pixel electrode;
• forming a second sacrificial film covering the second EL film;
• etching the second sacrificial film to form a second sacrificial layer comprising a region overlapping with the second pixel electrode;
• etching the second EL film and a part of the second insulating layer using the second sacrificial layer as a mask to form a second EL layer comprising a region overlapping with the second sacrificial layer and a third insulating layer comprising a first region overlapping with the first sacrificial layer and a second region overlapping with the second sacrificial layer and to expose a part of a top surface of the third insulating layer;
• forming an insulating film covering a top surface and a side surface of the first sacrificial layer, a side surface of the first EL layer, the top surface of the third insulating layer, a top surface and a side surface of the second sacrificial layer, and a side surface of the second EL layer;
• etching the insulating film to form a fourth insulating layer comprising a region in contact with the side surface of the first EL layer, a region in contact with the part of the top surface of the third insulating layer, and a region in contact with the side surface of the second EL layer and to form a fifth insulating layer over the first sacrificial layer and a sixth insulating layer over the second sacrificial layer;
• and
• removing the first sacrificial layer and the second sacrificial layer and removing the fifth insulating layer and the sixth insulating layer.

A method of fabricating a display device, comprising the steps of:

• forming a first pixel electrode and a second pixel electrode;
• forming a first insulating layer comprising a region covering an end portion of the first pixel electrode and a region covering an end portion of the second pixel electrode;
• forming an EL film over the first pixel electrode, the first insulating layer, and the second pixel electrode;
• forming a sacrificial film covering the EL film;
• etching the sacrificial film to form a first sacrificial layer comprising a region overlapping with the first pixel electrode and to form a second sacrificial layer comprising a region overlapping with the second pixel electrode;
• etching the EL film and a part of the first insulating layer using the first sacrificial layer and the second sacrificial layer as masks to form a first EL layer comprising a region overlapping with the first sacrificial layer, a second EL layer comprising a region overlapping with the second sacrificial layer, and a second insulating layer comprising a first region overlapping with the first sacrificial layer and a second region overlapping with the second sacrificial layer and to expose a part of a top surface of the second insulating layer;
• forming an insulating film covering a top surface and a side surface of the first sacrificial layer, a side surface of the first EL layer, the top surface of the second insulating layer, a top surface and a side surface of the second sacrificial layer, and a side surface of the second EL layer;
• etching the insulating film to form a third insulating layer comprising a region in contact with the side surface of the first EL layer, a region in contact with the part of the top surface of the second insulating layer, and a region in contact with the side surface of the second EL layer and to expose the first sacrificial layer and the second sacrificial layer;
• and
• removing the first sacrificial layer and the second sacrificial layer,
• wherein the EL film comprises a light-emitting layer emitting white light.