Semiconductor device and related chip and preparation method
AssigneeHuawei Technologies Co., Ltd.
InventorsWentao Yang, Loucheng Dai, Chaofan Song, Boning Huang, Zhihua Liu
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AssigneeHuawei Technologies Co., Ltd.
InventorsWentao Yang, Loucheng Dai, Chaofan Song, Boning Huang, Zhihua Liu
Estimating the term…
Embodiments of this application disclose a semiconductor device, a related chip, and a preparation method. The semiconductor device includes an N-type drift layer and an N-type field stop layer adjacent to the N-type drift layer. A density of free electrons at the N-type field stop layer is higher than a density of free electrons at the N-type drift layer. The N-type field stop layer includes first type impurity particles and second type impurity particles doped with the first type impurity particles, and a radius of the second type impurity particles is greater than a radius of the first type impurity particles. In the N-type field stop layer, an injection density of the first type impurity particles in a region adjacent to the N-type drift layer is higher than an injection density of the first type impurity particles in any other region.
A semiconductor device, comprising:
A power module, comprising:
Dependencies are inferred from the claim text.