Metal-coated substrates, interposers, and methods for production thereof

Abstract

Substrates may be metallized by introducing a seed layer upon a base substrate, mechanically polishing the seed layer, and forming a metal layer upon the seed layer after mechanical polishing. The base substrate may comprise a ceramic, such as silicon nitride or aluminum nitride, a polymer, silicon, metal, or glass. The seed layer optionally may be rendered electrically conductive by mechanical polishing of an initially non-conductive seed layer. The metal layer may be formed by depositing a metal nanoparticle composition upon the seed layer after mechanical polishing and consolidating metal nanoparticles therein, such as through a hot pressing operation. The metal nanoparticle composition may contain one or more additives that facilitate CTE matching of the metal layer to the base substrate.

Dependencies are inferred from the claim text.