Heater array and apparatus for processing a substrate including an heater array
AssigneeSemes Co., Ltd.
InventorsChungwoo Lee, Sungyoun Jeon, Inkyu Park, Yongseok Jang
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Abstract
An apparatus for processing a substrate may include a process chamber in which a desired process is performed, a supporting unit disposed in the process chamber, and a heater array disposed in the supporting unit. The heater array may include a plurality of heaters providing a plurality of heating areas, a plurality of diodes electrically connected to the plurality of heaters, respectively, and a controller operating the plurality of heaters. Here, adjacent diodes in the plurality of heating areas are arranged in opposed directions.
Claims12
A heater array comprising:
- a plurality of heaters providing a plurality of heating areas;
- a plurality of diodes electrically connected to the plurality of heaters, respectively;
- and
- a controller operating the plurality of heaters and a plurality of control lines for operating the plurality of heaters with each control line coupled to at least one of the plurality of diodes,
- wherein the heater array has an N×N (wherein N is a positive integer) matrix structure, orientation of diodes electrically connected to heaters disposed at odd number rows of the matrix structure is opposed to orientation of diodes electrically connected to heaters disposed at even number rows of the matrix structure, and diodes electrically connected to heaters disposed at each column of the matrix structure have a same orientation,
- wherein the controller includes N first switches electrically connected to heaters disposed at rows of the matrix structure and 2N second switches electrically connected to heaters disposed at columns of the matrix structure,
- wherein, in each column of the matrix structure, each of diodes electrically connected to heaters disposed at each column is connected to two second switches that are arranged in parallel, and the two second switches are connected to a positive pole and a negative pole of a power source, respectively,
- wherein the N first switches are connected to the positive pole and the negative pole of the power source, depending on the orientation of the plurality of diodes.
An apparatus for processing a substrate, which comprises:
- a process chamber in which a desired process is performed;
- a supporting unit disposed in the process chamber;
- and
- a heater array disposed in the supporting unit,
- wherein the heater array includes a plurality of heaters providing a plurality of heating areas, a plurality of diodes electrically connected to the plurality of heaters, respectively, and a controller operating the plurality of heaters and a plurality of control lines for operating the plurality of heaters with each control line coupled to at least one of the plurality of diodes,
- wherein the heater array has an N×N (wherein N is a positive integer) matrix structure, orientation of diodes electrically connected to heaters disposed at odd number rows of the matrix structure is opposed to orientation of diodes electrically connected to heaters disposed at even number rows of the matrix structure, and diodes electrically connected to heaters disposed at each column of the matrix structure have a same orientation,
- wherein the controller includes N first switches electrically connected to heaters disposed at rows of the matrix structure and 2N second switches electrically connected to heaters disposed at columns of the matrix structure,
- wherein, in each column of the matrix structure, each of diodes electrically connected to heaters disposed at each column is connected to two second switches that are arranged in parallel, and the two second switches are connected to a positive pole and a negative pole of a power source, respectively,
- wherein the N first switches are connected to the positive pole and the negative pole of the power source, depending on the orientation of the plurality of diodes.
Dependencies are inferred from the claim text.