Filter, manufacturing method thereof and electronic apparatus

A method for manufacturing a filter, comprising:

• providing a dielectric substrate, and integrating at least one inductor and at least one capacitor on the dielectric substrate, wherein the dielectric substrate comprises a first connection via penetrating through the dielectric substrate in a thickness direction of the dielectric substrate, and wherein the integrating at least one inductor and at least one capacitor on the dielectric substrate, comprises:
• forming a first auxiliary functional layer on the dielectric substrate, wherein the first auxiliary functional layer comprises a first accommodating portion and a second accommodating portion penetrating through the first auxiliary functional layer in a thickness direction of the first auxiliary functional layer;
• and
• forming a first connection electrode of each of the at least one inductor in the first connection vias, forming a first conductive film layer on a side of the dielectric substrate away from the first auxiliary functional layer, polishing the first conductive film layer through a CMP process to form a first conductive structure of each of the at least one inductor and a first plate of each of the at least one capacitor, and forming a second conductive structure of each of the at least one inductor on a side of the dielectric substrate away from the first conductive structure, wherein the first conductive structure is electrically connected to the second conductive structure through the first connection electrode to form a coil structure of each of the at least one inductor, the first plate fills in the first accommodating portion, the first conductive structure fills in the second accommodating portion, and a surface of each of the first plate and the first conductive structure away from the dielectric substrate is flush with a surface of the first auxiliary functional layer away from the dielectric substrate.