Parallel resonance antenna for radial plasma control

A plasma processing system, comprising:

• a plasma processing chamber;
• and
• a resonating structure comprising a radiating structure configured to generate plasma within the plasma processing chamber, the radiating structure comprising:
• a set of first arms coupled to a first capacitive plate of the resonating structure at a first end and a second capacitive plate of the resonating structure at a second end to form a set of first resonant circuits operating at a first resonance frequency, and
• a set of second arms coupled to the first capacitive plate of the resonating structure at a first end and to a third capacitive plate of the resonating structure at a second end to form a set of second resonant circuits operating at a second resonance frequency.

A resonating structure for plasma processing, the resonating structure comprising:

• a first capacitive plate formed by a first conductive plate, a first dielectric, and a bottom side of a housing of the resonating structure;
• a second capacitive plate formed by a second conductive plate, a second dielectric, and the bottom side of the housing of the resonating structure;
• a third capacitive plate formed by a third conductive plate, a third dielectric, and the bottom side of the resonating structure;
• a fourth capacitive plate formed by a fourth conductive plate, a fourth dielectric, and the bottom side of the resonating structure;
• a set of first arms coupled to the first capacitive plate at a first end and to the second capacitive plate at a second end to form a set of first resonant circuits operating at a first resonance frequency;
• and
• a set of second arms coupled to the third capacitive plate at a first end and to the fourth capacitive plate at a second end to form a set of second resonant circuits operating at a second resonance frequency.