Substrate processing apparatus
AssigneeSamsung Electronics Co., Ltd.
InventorsHyunjae Lee, Hyun Bae Kim, Sang Ki Nam, Hansin Bae, Junghwan Um
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AssigneeSamsung Electronics Co., Ltd.
InventorsHyunjae Lee, Hyun Bae Kim, Sang Ki Nam, Hansin Bae, Junghwan Um
Estimating the term…
Provided is a substrate processing apparatus including a chamber, a support member inside the chamber, a center bias electrode at an inner center region of the support member, an edge bias electrode at an inner edge region of the support member, a center power supply unit connected to the center bias electrode and configured to output a center start voltage at a start point of a control period and a center end voltage at an end point of the control period, and an edge power supply unit connected to the edge bias electrode and configured to output an edge start voltage at the start point and an edge end voltage at the end point, wherein a value obtained by subtracting the edge start voltage from the edge end voltage is greater than a value obtained by subtracting the center start voltage from the center end voltage.
A substrate processing apparatus comprising:
A substrate processing apparatus comprising:
A substrate processing apparatus comprising:
Dependencies are inferred from the claim text.