Base material and formation method thereof, and electronic device

A physical structure, applied to an electronic device, comprising:

• a transparent substrate, including a first surface and a second surface which are opposite to each other;
• a first film layer disposed over the first surface of the transparent substrate, wherein the first film layer includes a first light transmittance and includes a hollowed region and a non-hollowed region, the hollowed region is more light-transmissible than the non-hollowed region, and the hollowed region is so shaped that when backlight passes through the hollowed region, the physical structure including the first film layer displays a first graphic mark, such that the hollowed region is used as the first graphic mark;
• and
• a second film layer disposed over the first film layer, wherein the second film layer includes a second light transmittance and a set color, the first light transmittance is less than the second light transmittance, and wherein:
• a second graphic mark is disposed over the second film layer on a side facing away from the transparent substrate, wherein the second graphic mark does not overlap the hollowed region;
• a base layer is disposed over the first surface of the transparent substrate, wherein the first film layer is over the base layer;
• and the base layer is used to increase adhesion stability of the first film layer;
• a protective layer is disposed over the second film layer on a side facing away from the first film layer, wherein the protective layer is at least used for anti-fingerprint and/or anti-wear;
• and/or
• the second film layer is capable of blocking the first graphic mark under a first light condition and displaying the first graphic mark under a second light condition.