Scanning diffraction based overlay scatterometry
AssigneeKLA Corporation
InventorsItay Gdor, Yuval Lubashevsky, Vladimir Levinski, Daria Negri, Nickolai Isakovitch
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AssigneeKLA Corporation
InventorsItay Gdor, Yuval Lubashevsky, Vladimir Levinski, Daria Negri, Nickolai Isakovitch
Estimating the term…
A method includes illuminating an overlay target with a plurality of measurement cells. The method further includes receiving time-varying interference signals from a first and second photodetector as an overlay target is scanned along a stage-scan direction by a translation stage when implementing a metrology recipe. The overlay target may include a plurality of measurement cells, where each measurement cell includes a grating-over-grating structures including a first-layer grating feature on a first layer of the sample and a second-layer grating feature on a second layer of the sample in an overlapping region. The first-layer grating feature and the second-layer grating feature may have a similar pitch. The method includes determining one or more differential signals between the first photodetector and the second photodetector for each measurement cell of the plurality of measurement cells. The method includes determining an overlay measurement based on the determined one or more differential signals.
An overlay metrology system comprising:
An overlay metrology system comprising:
A method comprising:
Dependencies are inferred from the claim text.