Curable composition for stereolithography, evaporative pattern, and method for producing three-dimensional article
AssigneeMitsui Chemicals, Inc.
InventorsTakaaki Hayashi, Toshikazu Sakamaki
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Abstract
A curable composition for stereolithography, comprising a photopolymerizable component and a photopolymerization initiator, wherein a cured product of the curable composition has a minimum value of a storage elastic modulus, in a range of from 25° C. to 300° C., of not greater than 1.20×107 Pa.
Claims17
A curable composition for stereolithography, comprising a photopolymerizable component and a photopolymerization initiator, wherein an entirety of a single cured product of the curable composition has a minimum value of a storage elastic modulus, in a range of from 75° C. to 200° C., of not greater than 1.20×107 Pa, and has a storage elastic modulus, at 25° C., of 40×109 Pa or more, and the photopolymerizable component comprises a difunctional (meth)acrylic monomer.
Dependencies are inferred from the claim text.