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US 12,715,038 B2Granted
Method for producing film
AssigneeLG Chem, Ltd.
InventorsSo Jin Kim, Jong Min Shin, Dong Woo Yoo
Life of this patent
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Abstract
The present application provides a method for producing a film. In the present application, for example, a method for producing a film which can be applied to production of a heat-dissipating material such as a heat pipe can be provided.
Claims13
A method for producing a film, the method comprising:
- pattern-coating a slurry on a metal substrate, wherein the metal substrate has a thermal conductivity of about 8 Watts per meter per Kelvin (W/mK) or more;
- drying the pattern-coated slurry before sintering the pattern-coated slurry, wherein drying the pattern-coated slurry is performed at a temperature in a range of from 120° C. to 150° C.;
- and
- sintering the pattern-coated slurry to form a porous metal layer on the metal substrate to thereby produce the film that includes the metal substrate and the porous metal layer,
- wherein the slurry comprises thermally conductive metal particles, a binder, and an alcohol,
- wherein the metal substrate is the same material as the thermally conductive metal particles in the slurry,
- wherein sintering the pattern-coated slurry is performed at a temperature in a range of from 300° C. to 1100° C. in an atmosphere including hydrogen and argon,
- wherein the alcohol is texanol and/or terpineol,
- wherein the slurry comprises the alcohol in an amount of 160 to 500 parts by weight relative to 100 parts by weight of the thermally conductive metal particles,
- wherein the porous metal layer has a porosity of 70% or more, and
- wherein the porous metal layer has a thickness of 150 μm or less.
8 more elements
Dependencies are inferred from the claim text.