Biasable electrostatic chuck

A substrate support assembly, comprising:

• an electrostatic chuck body defining a substrate support surface that defines a substrate seat, wherein the electrostatic chuck body defines a backside gas lumen that extends through a surface of the substrate seat;
• a bias electrode comprising a conductive mesh disposed atop the surface of the substrate seat, the bias electrode comprising a plurality of conductive mesas that protrude upward from the conductive mesh;
• a support stem coupled with the electrostatic chuck body;
• at least one chucking electrode embedded within the electrostatic chuck body;
• and
• at least one heater embedded within the electrostatic chuck body.

A substrate support assembly, comprising:

• an electrostatic chuck body defining a substrate support surface that defines a substrate seat, wherein the electrostatic chuck body defines a backside gas lumen that extends through a surface of the substrate seat;
• a bias electrode coupled with the electrostatic chuck body, the bias electrode comprising a plurality of conductive mesas that protrude upward across the substrate seat;
• an edge ring coupled with a peripheral edge of the electrostatic chuck body, wherein an edge of the bias electrode comprises a conductive element that contacts the edge ring;
• a cooling plate disposed beneath the electrostatic chuck body, the cooling plate being coupled with a bottom surface of the edge ring;
• and
• an electrical connection between the edge ring and the cooling plate;
• a support stem coupled with the electrostatic chuck body;
• at least one chucking electrode embedded within the electrostatic chuck body;
• and
• at least one heater embedded within the electrostatic chuck body.