Bipolar electrostatic chuck electrode designs
AssigneeApplied Materials, Inc.
InventorsJian Li, Kallol Bera, Edward P. Hammond, Dmitry A. Dzilno, Juan Carlos Rocha-Alvarez, Xiaopu Li
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorsJian Li, Kallol Bera, Edward P. Hammond, Dmitry A. Dzilno, Juan Carlos Rocha-Alvarez, Xiaopu Li
Estimating the term…
Exemplary substrate support assemblies may include an electrostatic chuck body defining a substrate support surface that defines a substrate seat. The assemblies may include a support stem coupled with the electrostatic chuck body. The assemblies may include a first bipolar electrode embedded within the electrostatic chuck body. The assemblies may include a second bipolar electrode embedded within the electrostatic chuck body. An entirety of the second bipolar electrode may be radially inward of at least a portion of the first bipolar electrode. The first bipolar electrode and the second bipolar electrode may be coaxial with one another. Each of the first bipolar electrode and the second bipolar electrode may be coupled with at least one RF power supply. Each of the first bipolar electrode and the second bipolar electrode may be coupled with at least one DC power supply.
A substrate support assembly, comprising:
A substrate support assembly, comprising:
Dependencies are inferred from the claim text.