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US 12,709,803 B2Granted
Precursor delivery system for semiconductor device formation
AssigneeApplied Materials, Inc.
InventorsShashidhara Patel H B, Nagaraj Naik, Muhannad Mustafa
Life of this patent
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Abstract
Embodiments of precursor delivery systems are described herein. The precursor delivery systems include a reservoir having a cylindrical body, a conical shaped inlet on a first end of the cylindrical body, and a conical shaped outlet on a second end of the cylindrical body. Each of the conical shaped inlet and the conical shaped outlet independently have an angle in a range of from 5 degrees to 45 degrees.
Claims20
A precursor delivery system comprising:
- a reservoir having a cylindrical body, a conical shaped inlet on a first end of the cylindrical body, and a conical shaped outlet on a second end of the cylindrical body, each of the conical shaped inlet and the conical shaped outlet independently having an angle in a range of from 5 degrees to 45 degrees.
A precursor delivery system comprising:
- a reservoir having a cylindrical body, a conical shaped inlet on a first end of the cylindrical body, and a conical shaped outlet on a second end of the cylindrical body, each of the conical shaped inlet and the conical shaped outlet independently having an angle in a range of from 5 degrees to 45 degrees, the conical shaped inlet having an inlet valve connected to an inlet line and the conical shaped outlet having an outlet valve connected to an outlet line;
- and
- a controller connected to each of the inlet valve and the outlet valve, the controller configured to close the outlet valve to pressurize the reservoir and open the outlet valve to provide a uniform flow of a purge gas from the reservoir through the conical shaped outlet.
Dependencies are inferred from the claim text.