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US 12,709,053 B2Granted
Imprint mold, method for manufacturing the same and method for manufacturing reproduced imprint mold
AssigneesShin-Etsu Chemical Co., Ltd., Tohoku University
InventorsHiroyuki Yamazaki, Masao Ando, Masaki Takeuchi, Masaru Nakagawa, Shunya Ito
Life of this patent
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Abstract
An imprint mold having a synthetic quartz glass substrate having a transfer fine pattern formed on a surface thereof; and a coating layer formed on at least a part of the fine pattern by at least one of materials different from the substrate.
Claims15
An imprint mold comprising:
- a synthetic quartz glass substrate having a transfer pattern formed on a surface thereof;
- and
- a coating layer formed on at least a part of the transfer pattern by at least one of materials different from the substrate,
- wherein the coating layer is capable of being removed from the pattern,
- wherein a fracture strength of a portion of the transfer pattern where the coating layer is formed is higher than a fracture strength of the transfer pattern before the coating layer is formed,
- wherein the coating layer has a thickness of 50 nm or less, and variation in thickness is within 10% of an average value of the thickness of the coating layer,
- wherein the coating layer consists of a deposition of an atomic layer of the reaction product of at least two reactive precursors, and
- wherein the at least two reactive precursors are trimethylaluminum and water, which are reacted on the surface of the substrate to form an Al2O3 layer, and the coating layer is obtained by heating the Al2O3 layer formed on the surface of the substrate at a temperature of 100 to 900° C.
5 more elements
An imprint mold comprising:
- a synthetic quartz glass substrate having a transfer pattern formed on a surface thereof;
- and
- a coating layer formed on at least a part of the transfer pattern by at least one of materials different from the substrate,
- wherein the coating layer is capable of being removed from the pattern,
- wherein a fracture strength of a portion of the transfer pattern where the coating layer is formed is higher than a fracture strength of the transfer pattern before the coating layer is formed,
- wherein the coating layer has a thickness of 3 nm or less, and variation in thickness is within 10% of an average value of the thickness of the coating layer,
- wherein the coating layer consists of a deposition of the atomic layer of the reaction product of at least two reactive precursors, and
- wherein the at least two reactive precursors are trimethylaluminum and water, which are reacted on the surface of the substrate to form an Al2O3 layer, and the coating layer is obtained by heating the Al2O3 layer formed on the surface of the substrate at a temperature of 100 to 900° C.
5 more elements
An imprint mold comprising:
- a synthetic quartz glass substrate having a transfer pattern formed on a surface thereof;
- and
- a coating layer formed on at least a part of the transfer pattern by at least one of materials different from the substrate,
- wherein the coating layer is capable of being removed from the pattern,
- wherein a fracture strength of a portion of the transfer pattern where the coating layer is formed is higher than a fracture strength of the transfer pattern before the coating layer is formed,
- wherein the coating layer has a thickness of 3 nm or less, and variation in thickness is within 10% of an average value of the thickness of the coating layer, and
- wherein the coating layer consists of a deposition of the atomic layer of the reaction product of at least two reactive precursors, and
- wherein the at least two reactive precursors are trimethylaluminum and water, which are alternately supplied and reacted on the substrate surface by repeating the alternate supply up to 20 cycles to form an Al2O3 layer, and the coating layer is obtained by heating the Al2O3 layer formed on the surface of the substrate at a temperature of 100 to 900° C.
5 more elements
Dependencies are inferred from the claim text.