Wafer storage container processing apparatus

An apparatus for processing a wafer storage container, the wafer storage container including a body having a storage space connected to an opening, and a door detachable from the opening,

• the apparatus comprising:
• a stage having a disposition surface on which the wafer storage container is disposed;
• a gas supply including a gas supply nozzle that is provided on the stage and configured to supply an inert gas to the wafer storage container disposed on the stage;
• a gas collector including:
• a recovery tank;
• a groove formed in the stage and communicating with a gap formed between the body and the door when the door is attached to the body;
• a gas discharge port provided on the intersecting surface of the body;
• and
• a pipe connected between the groove and the recovery tank such that gas flowing through the gap is guided from the groove to the recovery tank through the pipe,
• wherein gas present in the storage space and replaced by the inert gas supplied from the gas supply is discharged from the storage space during supply of the inert gas by at least one of leaking through the gap and being discharged through the gas discharge port, and
• the recovery tank collects gas leaking through the gap and gas being discharged through the gas discharge port,
• wherein the gas supply nozzle is connected to a gas supply port provided on an intersecting surface of the body that intersects a surface having the opening, and
• the stage supports the wafer storage container such that the door remains attached to the body and is disposed to face downwards on the disposition surface.