Method of cleaning a nozzle
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsGuan Jung Chen, Shi-Ming Wang, Chia-Hung Tsai, Yuan-Yu Feng
Life of this patent
Estimating the term…
Loading patent…
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsGuan Jung Chen, Shi-Ming Wang, Chia-Hung Tsai, Yuan-Yu Feng
Estimating the term…
A method of cleaning a nozzle of a gas supply system includes loading an apparatus including a carrier and an automated nozzle cleaning system in the carrier onto a load port containing a gas supply system. The automated nozzle cleaning system includes a first nozzle cleaning device, a second nozzle cleaning device and a monitoring device, and the carrier is positioned to enable a gas inlet of the carrier to be connected to a nozzle of the gas supply system. The method also includes vacuuming contaminant particles from the nozzle using the first nozzle cleaning device, mechanically removing the contaminant particles adhering to the nozzle off the nozzle using the second nozzle cleaning device, and measuring a level of the contaminant particles using the monitoring device.
A method of cleaning a nozzle, the method comprising:
A method of cleaning a nozzle, the method comprising:
A method of cleaning a nozzle, the method comprising:
Dependencies are inferred from the claim text.