Data collection system, data collection apparatus, data collection method, and data collection program

A data collection method for a data collection apparatus connected to a first substrate processing apparatus having a first processing space and a second substrate processing apparatus having a second processing space different from the first processing space, the data collection apparatus including a processor, the data collection method comprising:

• comparing observed data observed when substrates having the same or similar shapes are processed under the same processing conditions in the first processing space and the second processing space, respectively, and calculating a correction amount for correcting the observed data observed when being processed in the second processing space, and
• correcting, based on the correction amount, the observed data observed when being processed while changing a processing condition in the second processing space, and collecting corrected observed data as the observed data observed when being processed in the first processing space,
• wherein the second substrate processing apparatus is additionally provided with a sensor that is not installed in the first substrate processing apparatus.

A non-transitory computer-readable recording medium having stored therein a data collection program for causing a computer of a data collection apparatus connected to a first substrate processing apparatus having a first processing space and a second substrate processing apparatus having a second processing space different from the first processing space, the data collection apparatus including a processor, to perform:

• comparing observed data observed when substrates having the same or similar shapes are processed under the same processing conditions in the first processing space and the second processing space, respectively, and calculating a correction amount for correcting the observed data observed when being processed in the second processing space, and
• correcting, based on the correction amount, the observed data observed when being processed while changing a processing condition in the second processing space, and collecting corrected observed data as the observed data observed when being processed in the first processing space,
• wherein the second substrate processing apparatus is additionally provided with a sensor that is not installed in the first substrate processing apparatus.