Method for manufacturing a solar cell

A method for manufacturing a solar cell, comprising:

• providing a substrate having a first surface and a second surface opposite to the first surface, wherein a target doped semiconductor layer is formed on the first surface, and a target doped dielectric layer is formed on a surface of the target doped semiconductor layer away from the first surface;
• forming concurrently a first doped layer on the second surface and a second doped layer on a side of the target doped dielectric layer away from the target doped semiconductor layer, wherein the first doped layer has a doping type different from a doping type of the target doped semiconductor layer;
• patterning the second doped layer, including removing portions of the second doped layer covering portions of the target doped dielectric layer over respective first regions of the first surface, wherein patterning the second doped layer includes localized laser irradiation;
• etching away the portions of the target doped dielectric layer over the respective first regions to expose portions of the target doped semiconductor layer over the respective first regions;
• etching away the portions of the target doped semiconductor layer over the respective first regions, and etching away portions of the second doped layer over respective second regions of the first surface to expose portions of the target doped dielectric layer over the respective second regions, wherein the respective first regions and the respective second regions are alternatingly distributed;
• and
• etching away the portions of the target doped dielectric layer over the respective second regions, leaving portions of the target doped semiconductor layer over the respective second regions to serve as doped semiconductor portions for the solar cell.