Back to results
US 12,707,718 B2Granted
Array substrate, method of manufacturing thereof, and display panel
AssigneeWuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
InventorsZuqiang Cao, Chao Dai
Life of this patent
Estimating the term…
Abstract
An array substrate, a method of manufacturing thereof, and a display panel are provided. A source-drain layers are formed by a laminated metal layer. The laminated metal layer includes a first metal layer, a second metal layer, and a third metal layer that are stacked in order. By etching the stacked metal layer twice, a width of the third metal layer in the formed source-drain layer is less than or equal to a width of the second metal layer, thereby solving the problem of the undercutting of the laminated metal electrode in the array substrate of the prior art.
Claims20
A method of manufacturing an array substrate, comprising following steps:
- step S10, forming an active layer, comprising providing a substrate and forming the active layer on the substrate;
- step S20, forming a gate, comprising forming a gate insulating layer on the active layer and a gate on the gate insulating layer;
- and
- step S30, forming a source-drain layer, comprising forming an interlayer insulating layer on the gate and the gate insulating layer, patterning the interlayer insulating layer to form a first via hole and a second via hole, and forming a laminated metal layer in the first via hole and the second via hole to be the source-drain layer;
- wherein the forming the laminated metal layer comprises following steps:
- step S31, forming a first metal layer, a second metal layer, and a third metal layer in the first via hole and the second via hole and above the interlayer insulating layer;
- and
- step S32, performing a photolithography process on the first metal layer, the second metal layer, and the third metal layer to form the laminated metal layer, wherein a width of the third metal layer is less than or equal to a width of the second metal layer, and a width of the third metal layer is less than a width of the first metal layer;
- wherein the first metal layer and the third metal layer are made of titanium, and the second metal layer is made of aluminum;
- and
- wherein in the step S32, the forming the laminated metal layer comprises following steps:
- step S321, coating a photoresist on the third metal layer, and exposing and developing the photoresist to form a patterned photoresist;
- step S322, performing a first etching on the first metal layer, the second metal layer, and the third metal layer by the patterned photoresist as a shield;
- step S323, ashing the patterned photoresist, wherein both sides of ashed photoresist pattern exposes a part of the third metal layer;
- step S324, performing a second etching on the third metal layer by the ashed patterned photoresist as a shield;
- and
- step S325, stripping the ashed patterned photoresist.
14 more elements
An array substrate, comprising:
- a substrate;
- an active layer disposed on the substrate;
- a gate insulating layer covering the active layer and the substrate;
- a gate disposed on the gate insulating layer;
- an interlayer insulating layer covering the gate and the gate insulating layer, wherein a first vie hole and a second via hole are formed in the interlayer insulating layer;
- a source-drain layer comprising a source and a drain disposed in the first via hole and the second via hole, wherein the source and the drain contact with the active layer through the first via hole and the second via hole;
- a planarization layer covering the source-drain layer and the interlayer insulating layer;
- and
- a pixel electrode disposed on the planarization layer;
- wherein the source and the drain comprise a laminated metal layer in the first via hole and the second via hole and on the interlayer insulating layer, the laminated metal layer comprises a first metal layer, a second metal layer, and a third metal layer, a width of the third metal layer is less than or equal to a width of the second metal layer, and the width of the third metal layer is less than a width of the first metal layer;
- wherein both sides of the second metal layer expose a part of a surface of the first metal layer on a side away from the substrate.
8 more elements
Dependencies are inferred from the claim text.