Silicon-on-insulator substrate processing for transistor enhancement
AssigneeSkyworks Solutions, Inc.
InventorsHailing Wang, Guillaume Alexandre Blin, David Scott Whitefield, Paul T. DiCarlo
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AssigneeSkyworks Solutions, Inc.
InventorsHailing Wang, Guillaume Alexandre Blin, David Scott Whitefield, Paul T. DiCarlo
Estimating the term…
Silicon-on-insulator (SOI) substrate processing for transistor enhancement is disclosed. In certain embodiments, a silicon substrate for an SOI process is separated into sub-regions or islands by dielectric. Thus, the substrate is changed from having one region and one shared contact into multiple substrate sub-regions with independent contacts. Since the substrate serves as a back gate to SOI transistors formed in an active silicon layer, breaking the substrate into independent or separate islands leads to a drop in the impact of each island on the drain-to-source voltage and/or gate-to-source voltage of the SOI transistors. Accordingly, reduced harmonics and improved linearity are achieved.
A silicon-on-insulator wafer comprising:
A packaged radio frequency module comprising:
A method of processing a silicon-on-insulator wafer, the method comprising:
Dependencies are inferred from the claim text.