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US 12,706,285 B2Granted
System and method for adaptive cleaning of a high-vacuum chamber
AssigneeIBSS Group
InventorsLarry Tran, Vince Carlino, George Naugle
Life of this patent
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Abstract
A system and a method for an adaptive plasma-cleaning process for a reaction chamber allow continual monitoring by a residual gas analyzer, while active plasma-cleaning is carried out in the reaction chamber. The system includes a valve system and a pump system that allow the residual gas analyzer to perform continual monitoring at a favorable pressure condition that is independent of the active plasma-cleaning process.
Claims7
A method for controlling a plasma cleaning process in a reaction chamber, comprising:
- (i) connecting a plasma generation device to provide reactive species into the reaction chamber;
- (ii) connecting a residual gas analyzer to the reaction chamber through a valve system, the valve system being selectively configurable to one of two states:
- (a) a first state, wherein the reaction chamber and the residual gas analyzer are connected by an opening of a first cross section area;
- and (b) a second state, wherein the reaction chamber and the residual gas analyzer are connected by an opening of a second cross section area that is much greater than the first cross section area;
- (iii) initiating operation of (a) a first vacuum pump, which configured for reducing pressure in the reaction chamber;
- and (b) a second vacuum pump, the second pump being configured to prevent pressure in the residual gas analyzer from rising above a predetermined value;
- (iv) making a measurement in the residual gas analyzer;
- (v) while the measurement in the residual gas analyzer indicates the reaction chamber is above a predetermined acceptable level of contamination:
- (a) setting the valve system to its first state;
- and
- (b) operating the plasma generating device, while monitoring each measurement made by the residual gas analyzer, until the measurement indicates that the reaction chamber is at or below the predetermined acceptable level of contamination;
- (vi) (a) setting the valve system to its second state;
- (b) making an additional measurement with the residual gas analyzer;
- (c) determining whether or not the additional measurement indicates that the reaction chamber remains at or below the predetermined acceptable level of contamination;
- and (d) repeating steps (iv) and (v) when the additional measurement indicates that the reaction chamber is above the predetermined acceptable level of contamination;
- and
- (vii) terminating the cleaning process.
14 more elements
Dependencies are inferred from the claim text.