Particle-induced x-ray emission using light and heavy particle beams

A method of Particle-Induced X-Ray Emission (PIXE) analysis comprising:

• delivering a plurality of pulses of first ions from a first ion source and comprising ions having a first composition onto an area of a sample, wherein the kinetic energy of the first ions is not greater than 50 kilo-electron-Volts (keV);
• simultaneously with the delivering of the plurality of pulses of first ions onto the sample area, delivering a plurality of pulses of second ions from a second ion source onto the sample area, the second ion beam comprising ions having a second composition, wherein the kinetic energy of the ions of the second ion beam is not greater than 50 keV;
• and
• detecting and measuring X-rays that are emitted from the sample area in response to the impingement of the pulses of the first and second ions thereto.

An analytical apparatus comprising:

• a first ion beam column comprising a first ion source and configured to deliver a first ion beam comprising ions having a first composition onto an area of a sample, whereby the delivered ions have kinetic energy that is not greater than 50 kilo-electron-Volts (keV);
• a second ion beam column comprising a second ion source and configured to, simultaneously with the delivering of the first ion beam onto the sample area, deliver a second ion beam comprising ions having a second composition onto the sample area, whereby the delivered ions of the second ion beam have kinetic energy that is not greater than 50 keV;
• and
• an X-ray detector configured to detect X-rays that are emitted from the sample area in response to the simultaneous delivery of the first and second ion beams thereto.

An analytical apparatus comprising:

• a first ion beam column comprising a first ion source and configured to deliver a first plurality of pulses of ions having a first composition onto an area of a sample, whereby the delivered ions have kinetic energy that is not greater than 50 kilo-electron-Volts (keV);
• a second ion beam column comprising a second ion source and configured to, simultaneously with the delivering of the first plurality of pulses of ions having the first composition onto the sample area, deliver a second plurality of pulses comprising ions having a second composition onto the sample area, whereby the delivered ions of the second plurality of pulses have kinetic energy that is not greater than 50 keV;
• and
• an X-ray detector configured to detect X-rays that are emitted from the sample area in response to the simultaneous delivery of the first and second ion beams thereto.