Methods and systems for nanoscale imaging based on second harmonic signal generation and through-focus scanning optical microscopy
AssigneeKLA Corporation
InventorsQiang Zhao, Ming Di
Life of this patent
Estimating the term…
Loading patent…
AssigneeKLA Corporation
InventorsQiang Zhao, Ming Di
Estimating the term…
Methods and systems for improved detection of defects of interest and measurement of structures buried within complex three dimensional semiconductor structures are described herein. Through-focus scanning optical microscopy (TSOM) using non-linear, second harmonic generation (SHG) light signals emitted from a sample provides interface-selective sensitivity for metrology and inspection of advanced semiconductor structures. A TSOM/SHG system includes a spectral filter to pass collected light at wavelengths corresponding to SHG emission. In some embodiments, a TSOM/SHG system includes an ultrafast, pulsed laser source emitting ultraviolet to near infrared wavelengths to efficiently induce SHG at surface interfaces. The halving of wavelength inherent to SHG enables a doubling of illumination wavelength without penalizing resolution. In a further aspect, a TSOM/SHG measurement system includes an exogenous illumination source, an external electric field source, or both, to induce a DC electric field at one or more interfaces of structures under illumination, thereby enhancing SHG emission.
A system comprising:
A method comprising:
A system comprising:
Dependencies are inferred from the claim text.