Treatment device for ablation
AssigneeOlympus Medical Systems Corp.
InventorsNobuko Matsuo, Kunihide Kaji, Yoshisane Nakamura
Life of this patent
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Abstract
An ablation treatment device for ablating treatment procedure used with endoscope device is disclosed. The ablation treatment device is inserted through the endoscope device and protruded into the human body, where the equipped neutral electrode and a gas channel for injecting inert gas is protruded. Together with another gas channel formed on the endoscope device, two types of gases are injected into the human body together with application of high frequency currents to perform ablation procedure. The ablation treatment device is controlled through a control circuit that administers control of the injection of the gases and application of high frequency currents.
Claims28
An endoscope system, comprising:
- an endoscope including an insertion channel;
- a treatment tube inserted through and protruding out from a distal end of the insertion channel, wherein the treatment tube includes an electrode and a first gas channel;
- a first gas source configured to supply a first gas at a first flow rate through the first gas channel;
- a second gas source configured to supply a second gas at a second flow rate through a second gas channel, wherein the second gas channel is the insertion channel and supplies the second gas from the distal end of the insertion channel;
- and
- a control circuit controlling the first gas source and the second gas source,
- wherein the control circuit is configured to send a control signal to the first gas source and the second gas source so that the second flow rate is larger than the first flow rate when both of the first gas and the second gas are supplied.
A control device for an endoscope, comprising:
- a controller including a control circuit for controlling a first gas source, and a second gas source,
- wherein the first gas source is configured to supply a first gas through a first gas channel from a treatment tool inserted into the endoscope,
- wherein the second gas source is configured to supply a second gas through a second gas channel,
- wherein the second gas channel is the insertion channel of the endoscope and supplies the second gas from a distal end of the insertion channel,
- wherein a flow rate of the first gas is a first flow rate and a flow rate of the second gas is a second flow rate, and
- wherein the control circuit is configured to send a control signal to the first gas source and the second gas source so that the second flow rate is larger than the first flow rate when both of the first gas and the second gas are supplied.
A method of controlling a flow of a first gas and a second gas in an endoscope, a first gas source configured to supply the first gas through a first gas channel in a treatment tube located in an insertion channel of the endoscope, and a second gas source configured to supply the second gas through a second gas channel in the endoscope, the method comprising:
- supplying the first gas at a first flow rate through the first gas channel aimed to reach beyond a distal end of an electrode;
- and
- supplying the second gas at a second flow rate through the second gas channel not aimed to reach beyond the distal end of an electrode included in the treatment tube,
- wherein the second gas channel is the insertion channel and supplies the second gas from a distal end of the insertion channel,
- wherein the second flow rate is larger than the first flow rate when both of the first gas and the second gas are supplied.
Dependencies are inferred from the claim text.