Substrate processing apparatus

A substrate processing apparatus comprising:

• a first processing unit, a second processing unit, and a third processing unit each configured to process a substrate, each of the first processing unit, the second processing unit, and the third processing unit including:
• a plurality of polishing modules each configured to polish the substrate;
• a cleaning module configured to clean the substrate;
• a drying module configured to dry the cleaned substrate;
• a substrate transporter extending from one side to opposite side of each processing unit;
• an elevating transporter configured to transport the substrate from the substrate transporter to one of the plurality of polishing modules and from the one of the plurality of polishing modules to the cleaning module;
• and
• a relay transporter configured to transport the substrate,
• the relay transporter of the first processing unit being configured to transport the substrate between the first processing unit and the second processing unit,
• the relay transporter of the second processing unit being configured to transport the substrate between the second processing unit and the third processing unit.