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US 12,699,322 B2Granted
Photosensitive resin composition, photosensitive dry film, layered product, and pattern formation method
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKumiko Hayashi, Kyoko Soga
Life of this patent
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Abstract
The coating formed from the photosensitive resin composition has excellent resolution and improved microprocessing properties, as well as satisfactory reliability in terms of adhesion and crack resistance, resolution, and flexibility. The photosensitive resin composition includes (A) a polymer including a silicone skeleton and (B) photo-acid generators, wherein the photo-acid generators (B) comprise (B1) a photo-acid generator which is an onium salt and (B2) a photo-acid generator which is not an onium salt.
Claims13
A photosensitive resin composition comprising of:
- (A) a silicone skeleton-containing polymer;
- (B) a photoacid generator,
- (C) optionally, a crosslinker;
- (D) optionally, a solvent;
- and
- (E) optionally, a quencher;
- wherein the silicone skeleton-containing polymer (A) consisting of:
- repeat units having the formulae (a1), (a3), (a4), (b1), (b3) and (b4), and
- optionally repeat units having the formulae (a2), and (b2):
- wherein R1 to R4 are each independently a C1-C8 monovalent hydrocarbon group, m is an integer of 1 to 600,
- a1 to a4 and b1 to b4 are numbers in the range:
- 0<a1<1,0<a2<1,0<a3<1,0<a4<1,0<b1<1,0<b2<1,0<b3<1,0<b41,0<a1+a2+a3+a4<1,0<b1+b2+b3+b4<1, and a1+a2+a3+a4+b1+b2+b3+b4=1,
- X1 is a divalent group having the formula (X1), X2 is a divalent group having the formula (X2), X3 is a divalent group having the formula (X3), X4 is a divalent group having the formula (X4),
- wherein Z1 is a single bond, methylene group, propane-2,2-diyl group, 1,1,1,3,3,3-hexafluoropropane-2,2-diyl group or fluorene-9,9-diyl group, R11 and R12 are each independently hydrogen or methyl, R13 and R14 are each independently a C1-C4 alkyl group or C1-C4 alkoxy group, p1 and p2 are each independently an integer of 0 to 7, q1 and q2 are each independently an integer of 0 to 2,
- wherein Z2 is a single bond, methylene group, propane-2,2-diyl group, 1,1,1,3,3,3-hexafluoropropane-2,2-diyl group or fluorene-9,9-diyl group, R21 and R22 are each independently hydrogen or methyl, R23 and R24 are each independently a C1-C4 alkyl group or C1-C4 alkoxy group, r1 and r2 are each independently an integer of 0 to 7, s1 and s2 are each independently an integer of 0 to 2,
- wherein R31 and R32 are each independently hydrogen or methyl, t1 and t2 are each independently an integer of 0 to 7,
- wherein R41 and R42 are each independently hydrogen or methyl, R43 and R44 are each independently a C1-C8 monovalent hydrocarbon group, u1 and u2 are each independently an integer of 0 to 7, and v is an integer of 0 to 600,
- wherein the photoacid generator (B) contains (B1) a photoacid generator in the form of an onium salt and (B2) a photoacid generator other than an onium salt.
15 more elements
Dependencies are inferred from the claim text.