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US 12,696,908 B2Granted
Reactive gas, reactive gas generation system and product treatment using reactive gas
AssigneeNanoGuard Technologies, LLC
InventorsKevin M. Keener, Mark A. Hochwalt
Life of this patent
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Abstract
A method of treating a product or surface with a reactive gas, comprises producing the reactive gas by forming a high-voltage cold plasma (HVCP) from a working gas; transporting the reactive gas at least 5 cm away from the HVCP; followed by contacting the product or surface with the reactive gas. The HVCP does not contact the product or surface.
Claims15
A method of treating a product with a reactive gas, comprising:
- producing the reactive gas by forming a high-voltage cold plasma (HVCP) from a working gas with a dielectric barrier discharge (DBD) system;
- transporting the reactive gas at least 0.5 meters away from the HVCP;
- followed by
- contacting the product with the reactive gas;
- wherein the HVCP does not contact the product, and
- the reactive gas comprises at least one reactive or excited species other than ozone.
3 more elements
Dependencies are inferred from the claim text.