Method of making semiconductor device having reduced bump height variation
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJing-Cheng Lin, Po-Hao Tsai
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJing-Cheng Lin, Po-Hao Tsai
Estimating the term…
A method of making a semiconductor device includes patterning a photoresist on a substrate to form a plurality of openings. A first opening has a first width, a second opening has a second width, smaller than the first width, and a third opening is between the first opening and the second opening and has a third width, different from the first width and the second width. The width is measured in a direction parallel to a top surface of the substrate. The method further includes plating a first conductive material into each opening of the plurality of openings in the photoresist. Plating the first conductive material includes plating of the first conductive material to a first height in the first opening, plating the first conductive material to a second height in the second opening, and plating the first conductive material to a third height in the third opening.
A method of making a semiconductor device, the method comprising:
A method of making a semiconductor device, the method comprising:
A method of making a semiconductor device, the method comprising:
Dependencies are inferred from the claim text.