Manufacturing method for patterned quantum dot film layer comprising replacing native ligands of quantum dot thin film by replacement ligands
AssigneeBoe Technology Group Co., Ltd.
InventorHaowei Wang
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AssigneeBoe Technology Group Co., Ltd.
InventorHaowei Wang
Estimating the term…
A patterned quantum dot film layer, a quantum dot light-emitting device and a manufacturing method. The manufacturing method includes: forming a patterned mask layer on one side of a base substrate; forming a quantum dot thin film on the side of the mask layer that faces away from the base substrate, the quantum dot thin film includes quantum dot bodies and native ligands connected to the quantum dot bodies; forming, on the side of the quantum dot thin film that faces away from the mask layer, a ligand thin film that includes replacement ligands, and leaving same to stand for a first duration, such that the native ligands are replaced by the replacement ligands; performing cleaning by means of a cleaning solvent, removing unreacted replacement ligands and replaced native ligands; peeling off the mask layer, and removing together the quantum dot thin film attached to the mask layer.
A manufacturing method for a patterned quantum dot film layer, comprising:
Dependencies are inferred from the claim text.