Method for producing silicon-based active material particles and silicon-based active material precursor particles
AssigneeOSAKA Titanium technologies Co., Ltd.
InventorsKohki Takeshita, Yusuke Kashitani
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AssigneeOSAKA Titanium technologies Co., Ltd.
InventorsKohki Takeshita, Yusuke Kashitani
Estimating the term…
A method for producing a silicon-based active material precursor particle includes a laminated coating forming step for forming a laminated coating of a silicon-based active material on a substrate by repeating a vapor deposition step for depositing a silicon-based active material forming material on the substrate to form the silicon-based active material forming material having a multilayer structure. Following the laminated coating step, the method includes a scraping step for scraping off the laminated coating of the silicon-based active material from the substrate after repeating the vapor deposition step to obtain the silicon-based active material precursor particle having the multilayer structure as a part thereof. The substrate can be a rotating body having a horizontal axis for repeating the vapor deposition step or be one that is relatively movable with respect to the supply path of the silicon-based active material for repeating the vapor deposition step.
A method for producing a silicon-based active material precursor particle, comprising:
Dependencies are inferred from the claim text.