Managing beam power effects by varying base emissivity

A system for mounting and heating a workpiece, comprising:

• an electrostatic chuck;
• a base, separate from the electrostatic chuck, wherein an electrochromic material is disposed on a top surface of the base;
• a controller configured to modify an amount of heat transfer between the electrostatic chuck and the base, based on a power level of an incoming ion beam;
• and an electrochromic power supply in communication with the electrochromic material and the controller, wherein the controller controls a voltage supplied to the electrochromic material by the electrochromic power supply.

A system for mounting and heating a workpiece, comprising:

• an electrostatic chuck;
• a base, separate from the electrostatic chuck;
• and
• a controller configured to modify an amount of heat transfer between the electrostatic chuck and the base, based on a power level of an incoming ion beam;
• and
• movable shields disposed between the electrostatic chuck and the base.