Metal grid flexible transparent conductive film and its preparation method and applications

A metal grid flexible transparent conductive film, comprising a flexible substrate and a sputtered metal grid,

• wherein the metal grid is disposed on the flexible substrate;
• wherein the flexible substrate is selected from a flexible PET substrate, a CPI substrate, and a flexible ultra-thin glass;
• and
• the metal grid is a metal Ag grid,
• the metal grid flexible transparent conducive film is prepared by a method comprising:
• S1, preparing a polymer template, cutting a desired hollow parallel stripe pattern in the center of the polymer template;
• S2, taping a flexible substrate to a substrate to form a flexible substrate/baseboard assembly, and fixing the polymer template prepared in S1 to the flexible substrate to form a template/substrate/baseboard assembly;
• S3, placing the template/substrate/baseboard assembly into a magnetron sputtering coating device, passing a rare gas under vacuum conditions, adjusting the power, sputtering a metal target onto the flexible substrate by magnetron sputtering method for deposition, separating the template from the template/substrate/baseboard assembly to obtain the metal grid flexible and transparent conductive film;
• wherein:
• S1 further comprises adjusting cutting parameters of laser to obtain different polymer template patterns, the cutting parameters comprising cutting energy, cutting spacing and cutting length, the cutting energy is 8-20 W, the cutting spacing is 100-500 μm and the cutting length is 2-20 cm;
• S3 further comprises placing the template facing the Ag target under a vacuum of 10−5-10−9 torr, the magnetron sputtering gas Ar bombard the target at a sputtering power of 300-500 W for 90-600 s under a partial pressure of Ar of 60%-70%;
• the thickness of metal grid is 150 nm-600 nm;
• the line width of the metal grid is 1 μm-10 μm;
• the metal grid flexible transparent conductive film has a sheet resistance of 4-1002 sq−1;
• a light transmittance rate of the metal grid at 550 nm reaches 90% or more;
• and
• an overall transmittance of the metal grid flexible transparent conductive film at 550 nm is more than 82%.