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AssigneeASML Netherlands B.V.
InventorsAndrey Nikipelov, Sander Baltussen, Vadim Yevgenyevich Banine, Alexandr Dolgov, Inci Donmez Noyan, Zomer Silvester Houweling, Arnoud Willem Notenboom, Marcus Adrianus Van De Kerkhof, Ties Wouter Van Der Woord, Paul Alexander Vermeulen, David Ferdinand Vles, Victoria Voronina, Halil Gökay Yegen
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A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.
A membrane for a lithographic apparatus, a metrology tool or an inspection tool, the membrane comprising a network of non-aligned boron nitride nanotubes, transition metal chalcogenide nanotubes, or a combination thereof.
A membrane for a lithographic apparatus, a metrology tool or an inspection tool, the membrane comprising transition metal chalcogenide nanotubes.
A membrane for a lithographic apparatus, a metrology tool or an inspection tool, the membrane comprising a network of non-aligned boron nitride nanotubes.
Dependencies are inferred from the claim text.