Deposition apparatus

A deposition apparatus comprising:

• a chamber including an internal space where a deposition process takes place;
• and
• at least one magnet unit positioned below the chamber and including a first magnet member and a second magnet member, the second magnet member being positioned around an outer periphery of the first magnet member and spaced apart from the first magnet member,
• wherein
• the first magnet member includes a first magnet main body, which extends in a first direction, and a first magnet extension, which is positioned at least one end of the first magnet main body and has a width greater than a width of the first magnet main body in a second direction intersecting the first direction,
• the first magnet extension includes a penetration hole, and
• a width, in the second direction, of the penetration hole is smaller than the width, in the second direction, of the first magnet main body.