Quantum dot surface treatment method and surface treatment apparatus
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsYoshihiro Nojima, Shinji Aoki, Kazuya Tobishima
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AssigneeShin-Etsu Chemical Co., Ltd.
InventorsYoshihiro Nojima, Shinji Aoki, Kazuya Tobishima
Estimating the term…
A quantum dot surface treatment method including continuously supplying a solution containing a silicone compound and a quantum dot having a surface to which a ligand having a coordinating substituent and a reactive substituent is coordinated by virtue of the coordinating substituent, to a reaction flow path made of a material that transmits light, and emitting light to the reaction flow path, so that the silicone compound and the reactive substituent undergo a photopolymerization reaction, thereby coating the surface of the quantum dot with the silicone compound. Thus, the quantum dot surface treatment method is provided that enables to, even in the case of performing surface treatment using a large amount of solution, obtain a quantum dot having excellent stability with high productivity by stably coating the surface of the quantum dot with the silicone compound, and provide a wavelength conversion material with high reliability.
A quantum dot surface treatment method comprising continuously supplying a solution containing a silicone compound and a quantum dot having a surface to which a ligand having a coordinating substituent and a reactive substituent is coordinated by virtue of the coordinating substituent, to a reaction flow path made of quartz, and emitting light to the reaction flow path, so that the silicone compound and the reactive substituent undergo a photopolymerization reaction, thereby coating the surface of the quantum dot with the silicone compound, wherein
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