Substrate processing apparatus and substrate processing system
AssigneeSCREEN Holdings Co., Ltd.
InventorsKoji Ando, Tomohiro Motono, Noritake Sumi
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AssigneeSCREEN Holdings Co., Ltd.
InventorsKoji Ando, Tomohiro Motono, Noritake Sumi
Estimating the term…
A substrate processing apparatus and a substrate processing system according to the invention includes a processing chamber having a processing space capable of accommodating a substrate inside, being provided with an aperture on a side surface thereof, which communicates with the processing space to cause the substrate to pass therethrough, and being disposed under a downflow environment, a lid part which closes and opens the aperture, a fluid supplier which supplies a heated processing fluid to be used for processing the substrate to the processing space closed by the lid part, and a regulator which guides at least part of an air flowing as the downflow to around the processing chamber and generates an airflow having a uniform flow velocity along an outer surface of the processing chamber.
A substrate processing apparatus provided in a clean room where a downflow is generated by a fan filter unit provided to a ceiling of the clean room, the substrate processing apparatus comprising:
A substrate processing system, comprising:
Dependencies are inferred from the claim text.